Please use this identifier to cite or link to this item: http://hdl.handle.net/10497/1679
Title: Studies on a plasma soft X-ray source for microlithography using a chemically-amplified resist
Authors: Wong, Darren Jon Sien
Issue Date: 2005
URI: http://hdl.handle.net/10497/1679
Issued Date: 2005
Call Number: QC718.5.D38 Won
Appears in Collections:Doctor of Philosophy (Ph.D.)

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