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A 160 kJ dual plasma focus (DuPF) for fusion-relevant materials testing and nano-materials fabrication
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Saw, S. H., Damideh, V., Chong, P. L., Lee, P. C. K., Rawat, R. S., & Lee, S. (2014). A 160 kJ dual plasma focus (DuPF) for fusion-relevant materials testing and nano-materials fabrication. International Journal of Modern Physics: Conference Series, 32(2014): 1460322.
This paper summarizes PF-160 Dual Plasma Focus (DuPF) numerical experiments using the Lee Model code and preliminary 3D design drawings using SolidWorks software. This DuPF consists of two interchangeable electrodes enabling it to be optimized for both Slow Pinch Mode (SFM) and Fast Pinch Mode (FFM); the latter using a speed factor (SF) of 90 kA cm-1 Torr-0.5 for FFM in deuterium [S Lee et al, IEEE Trans Plasma Science 24, 1101-1105 (1996)]; and the former with SF of less than half that value for SFM. Starting with available 6 x 450 μF capacitors rated at 11kV (10% reversal), numerical experiments indicate safe operation at 9 kV, 6 Torr deuterium with FFM anode of 5 cm radius; producing intense ion beam and streaming plasma pulses which would be useful for studies of potential fusion reactor wall materials. On the other hand operating
at 5 kV, 10 Torr deuterium with SFM anode of 10 cm radius leads to long- duration, uniform large-area flow which could be more suitable for synthesis of nano-materials. The dual plasma focus design is illustrated here with two figures showing FFM and SFM electrodes.
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