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Title: Repetitive operation of a dense plasma soft x-ray source for micromachining
Authors: Wong, D.
Tan, Augustine Tuck Lee
Patran, Alin Constantin
Hassan, S. M.
Zhang, T.
Springham, Stuart Victor
Lee, Sing
Rawat, Rajdeep Singh
Lee, Paul Choon Keat
Issue Date: 2005
Citation: Paper presented at the 6th International Conference on Dense Z-Pinches, Oxford, United Kingdom, 25-28 July 2005
Abstract: The NX2 device, a low energy plasma focus, at the Nanyang Technological University in Singapore, was used as a soft X-ray (SXR) source for micromachining. The gas used was neon which produced SXRs in a narrow spectral range of 0.9 - 1.6 keV. The SXR yield from repetitive operation of the NX2 device was monitored and measured using a cost effective multi-channel SXR spectrometric system. The system consists of filtered BPX65 PIN diodes, with the associated electronics --- an integrator, sample and peak holder, analogue switch, an A/D converter and a microcontroller. The system enables easy shot-to-shot statistical analysis under repetitive operation at adjustable preset trigger frequencies. A total of 4000 shots were fired at 0.5 Hz, using the same gas filling. The SXR production was at an average yield of 60 J/shot and a maximum single-shot yield of more than 100 J. The SXRs emitted by the NX2 device was used for contact micromachining, producing structures with an excellent aspect ratio of up to 20:1 on 25 μm SU-8 resist.
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