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X-ray source using argon plasma focus
Author
Tan, Oon How
Supervisor
Lee, Paul Choon Keat
Abstract
The global push for information processing speed has demanded continual reductions in the IC feature sizes. The current photolithography is reaching diffraction limits to further decrease the line widths to 0.1 micron and below. As a result, there is now a worldwide move towards microlithography using radiative energy of shorter wavelengths, such as electron beams or soft x-rays (SXR) as the newt generation lithography. Slightly harder X-rays are needed in micromachining.
The aim of the work is to investigate the possibility of plasma focus device becoming a reliable and cost-effective SXR source in X-ray lithography.
Few powerful SXR sources based on plasma compressions in neon and argon have been developed in the ME plasma lab. The project uses one of the plasma
focus machines, NX2 to study the spot size of X-ray emitted from argon compression.
Techniques involving masks, photo-resists and use of equipment such as the spinner and electron microscope have been utilized durng the course of experimentation. The current discharge of the machine and other relevant experimental results are checked against the data generated by a computer simulation based on the Lee Model to test for the reliability and reproducibility of the SXR source from argon compression.
The size of the point-like X-ray source was measured by a pinhole camera based on the CCD and computer. The FWHM of the shot images overlay (equivalent to the diameter of the SXR source spot) was measured 0.27 mm, meeting the requirement of lithography with 0.lpm resolution. A comparison was also made between sample sub-micron lines obtained from microlithographic transfers using neon compression and a simple X-ray tube.
In conclusion, the machine is competent in producing SXR of very small spot size and short wavelength capable of defining very high-resolution images in suitable photoresists. This is advantageous in the advancement of lithography into sub-0.1 micron line width. Experiments with SXR from argon compressions are still ongoing.
With more research work to optimize its x-ray production for practical applications, it is envisaged that this relatively new SXR source will become a leading technology preferred in both microlithogaphy and micromachining.
The aim of the work is to investigate the possibility of plasma focus device becoming a reliable and cost-effective SXR source in X-ray lithography.
Few powerful SXR sources based on plasma compressions in neon and argon have been developed in the ME plasma lab. The project uses one of the plasma
focus machines, NX2 to study the spot size of X-ray emitted from argon compression.
Techniques involving masks, photo-resists and use of equipment such as the spinner and electron microscope have been utilized durng the course of experimentation. The current discharge of the machine and other relevant experimental results are checked against the data generated by a computer simulation based on the Lee Model to test for the reliability and reproducibility of the SXR source from argon compression.
The size of the point-like X-ray source was measured by a pinhole camera based on the CCD and computer. The FWHM of the shot images overlay (equivalent to the diameter of the SXR source spot) was measured 0.27 mm, meeting the requirement of lithography with 0.lpm resolution. A comparison was also made between sample sub-micron lines obtained from microlithographic transfers using neon compression and a simple X-ray tube.
In conclusion, the machine is competent in producing SXR of very small spot size and short wavelength capable of defining very high-resolution images in suitable photoresists. This is advantageous in the advancement of lithography into sub-0.1 micron line width. Experiments with SXR from argon compressions are still ongoing.
With more research work to optimize its x-ray production for practical applications, it is envisaged that this relatively new SXR source will become a leading technology preferred in both microlithogaphy and micromachining.
Date Issued
2001
Call Number
QC718 Tan
Date Submitted
2001