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Plasma soft X-ray source for microelectronic lithography
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Type
Thesis
Author
Zhang, Guixin
Supervisor
Lee, Sing
Abstract
Two different compact Plasma Focus (PF) devices --- NNSXl and NNSX2 were set up and developed as plasma soft x-ray sources for microelectronic lithography. This thesis reports investigation of soft x-ray emission from the plasma focus. Experiments were carried out under various experimental conditions, such as different configurations of PF chambers, different anode lengths, different initial neon pressures, different charging voltages, different polarities of central electrode as well as different repetition rates.
The spectrum of soft x-ray emitted from the plasma focus was investigated by flat crystal spectrography as well as filtered 5-channel PIN detectors. The results show that the x-ray emission is mainly within the wavelength range from 0.8 nm to 1.4 nm, that is just suitable for x-ray lithography.
The size of the point-like x-ray source was measured by a high repetitive rate pinhole camera based on the CCD and computer. The FWHM of the image overlay of 50 shots is about 0.6 mm (
The total soft x-ray yield was studied. 85 Jlshot (average) was obtained with the optimized conditions of NNSX1. For NNSX2, 20 J of soft x-ray output was achieved at repetition rate of up to 16 Hz to produce 300 W soft x-ray in burst duration of several minutes.
Demonstrations of lithographic application were done with NNSXl and NNSX2. Five different x-ray resists were tested with specially designed masks. Patterns with linewidths of 0.2 pm were successfully transferred using the NNSX2. E-beam lithography was also done with NNSXl.
The spectrum of soft x-ray emitted from the plasma focus was investigated by flat crystal spectrography as well as filtered 5-channel PIN detectors. The results show that the x-ray emission is mainly within the wavelength range from 0.8 nm to 1.4 nm, that is just suitable for x-ray lithography.
The size of the point-like x-ray source was measured by a high repetitive rate pinhole camera based on the CCD and computer. The FWHM of the image overlay of 50 shots is about 0.6 mm (
The total soft x-ray yield was studied. 85 Jlshot (average) was obtained with the optimized conditions of NNSX1. For NNSX2, 20 J of soft x-ray output was achieved at repetition rate of up to 16 Hz to produce 300 W soft x-ray in burst duration of several minutes.
Demonstrations of lithographic application were done with NNSXl and NNSX2. Five different x-ray resists were tested with specially designed masks. Patterns with linewidths of 0.2 pm were successfully transferred using the NNSX2. E-beam lithography was also done with NNSXl.
Date Issued
1999
Call Number
QC718 Zha
Date Submitted
1999