Investigation of oxidation behaviors of the γ-tial substrate and plasma grown Mo-Si-Ti coating at 750°C

Please use this identifier to cite or link to this item: http://hdl.handle.net/10497/25802

Title:	Investigation of oxidation behaviors of the γ-tial substrate and plasma grown Mo-Si-Ti coating at 750°C
Authors:	Li, Fengkun Rawat, Rajdeep Singh Zhang, Pingze Wei, Dongbo Yang, Kai Dang, Bo
Keywords:	γ-TiAl Mo-Si-Ti Plasma coating Oxidation.
Issue Date:	2023
Publisher:	Elsevier
Citation:	Li, F., Rawat, R. S., Zhang, P., Wei, D., Yang, K., & Dang, B. (2023). Investigation of oxidation behaviors of the γ-tial substrate and plasma grown Mo-Si-Ti coating at 750°C. Vacuum, 217, Article 112547. https://doi.org/10.1016/j.vacuum.2023.112547
Journal:	Vacuum
URI:	http://hdl.handle.net/10497/25802
ISSN:	0042-207X (print) 1879-2715 (online)
DOI:	10.1016/j.vacuum.2023.112547
Grant ID:	BK20180068 2018M630555 XCA20013-1
Funding Agency:	Natural Science Foundation for Excellent Young Scientists of Jiangsu Province, China China Postdoctoral Science Foundation Harsh Environment Key Laboratory of Ministry of Industry and Information Technology
File Permission:	None
File Availability:	No file
Appears in Collections:	Journal Articles

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